Sunday, December 28, 2008

Planar Magnetron RF Sputtering

Magnetron Sputtering Unit with single magnetron source of 4" size [target] is Vacuum Chamber measures 12 inch. dia. x 10 inch. height glass chamber with both ends open and achieve vacuum sealing with top plate and bottom plate. A target holder, for the material to be sputtered, made of copper with provision for cooling by water circulation .A high speed vacuum pumping system fully integrated with necessary piping and valves, all operated manually is rated for high gas through put handling and to produce clean and high vacuum in the chamber.
All the electrical controls and instruments are housed in the main unit at convenient place for smooth operation .

For More Information click on the given link:-
For more information about other instruments,click on the given link:-

No comments: